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Investigation of high quality GaAs:In layers grown by liquid phase epitaxy

Author
MILANOVA, M; CHOLAKOVA, T; BEDIKJAN, L; STANEV, N
Inst. applied physics, 4000 Plovdiv, Bulgaria
Source

Journal of electronic materials. 1994, Vol 23, Num 11, pp 1235-1237 ; ref : 9 ref

CODEN
JECMA5
ISSN
0361-5235
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Institute of Electrical and Electronics Engineers, New York, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Addition indium Composé binaire Concentration impureté Croissance cristalline en solution Densité porteur charge Dopage cristal Etude expérimentale Gallium arséniure LPE Matériau semiconducteur Mobilité porteur charge Photoluminescence Structure cristalline As Ga GaAs:In Composé minéral
Keyword (en)
Indium additions Binary compounds Impurity density Crystal growth from solutions Carrier density Crystal doping Experimental study Gallium arsenides LPE Semiconductor materials Carrier mobility Photoluminescence Crystal structure Inorganic compounds
Keyword (es)
Concentración impureza
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55L Defects and impurities: doping, implantation, distribution, concentration, etc

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15L Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)

Pacs
6855L Defects and impurities: doping, implantation, distribution, concentration, etc

Discipline
Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3321443

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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