MOCVD growth on AlGaAs substrates
- Author
- KOHAMA, Y; OHISO, Y; TATENO, K; AMANO, C; KUROKAWA, T
NTT Opto-Electronics Laboratories, Atsugi-shi Kanagawa 243-01, Japan - Conference title
- Metalorganic vapor phase epitaxy 1994
- Conference name
- ICMOVPE-VII. International conference (7 ; Yokohama 1994-05-31)
- Author (monograph)
- MINAGAWA, SHIGEKAZU (Editor); HORIKOSHI, YOSHIJI (Editor)1
Japan Society of Applied Physics, Tokyo, Japan (Funder/Sponsor)
Foundation for Advancement of International science (Funder/Sponsor)
[1] NTT Basic Research Laboratories, Kanagawa 243-01, Japan - Source
Journal of crystal growth. 1994, Vol 145, Num 1-4, pp 970-971 ; ref : 2 ref
- CODEN
- JCRGAE
- ISSN
- 0022-0248
- Scientific domain
- Crystallography; Geology; Metallurgy, welding
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Aluminium arséniure CVD Composé ternaire Croissance cristalline en phase vapeur Croissance film Etude expérimentale Gallium arséniure Hétérojonction Matériau semiconducteur Phototransistor Substrat Al As Ga AlGaAs Substrat AlGaAs Composé minéral Composé organométallique
- Keyword (en)
- Aluminium arsenides CVD Ternary compounds Crystal growth from vapors Film growth Experimental study Gallium arsenides Heterojunctions Semiconductor materials Phototransistors Substrates Inorganic compounds Organometallic compounds
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H65 Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Pacs
- 6865 Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3405920
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0022-0248(94)91174-6 
https://dx.doi.org/10.1016/0022-0248(94)91174-6
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