Modelling of bias sputter deposition processes
- Author
- BERG, S; KATARDJIEV, I. V
Uppsala univ., inst. technology, 75121 Uppsala, Sweden - Conference title
- ICMTCF94 : international conference on metallurgical coatings and thin films
- Conference name
- ICMTCF94 : international conference on metallurgical coatings and thin films (21 ; San Diego CA 1994-04-25)
- Author (monograph)
- SARTWELL, BRUCE D (Editor)1 ; MCGUIRE, GARY E (Editor)2 ; JEHN, HERMANN A (Editor)3
American Vacuum Society ; Vacuum Metallurgy, United States (Funder/Sponsor)
American Vacuum Society ; Thin Film Division, United States (Funder/Sponsor)
[1] US naval res. lab., Washington DC, United States
[2] Microelectronics cent. North Carolina, Research Triangle Park NC, United States
[3] Forschunginstitut Edelmetalle Metallchemie, Schwäbisch Gmünd, Germany - Source
Surface & coatings technology. 1994, Vol 68-69, pp 325-331 ; ref : 16 ref
- CODEN
- SCTEEJ
- ISSN
- 0257-8972
- Scientific domain
- General chemistry, physical chemistry; Metallurgy, welding
- Publisher
- Elsevier, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Dépôt physique phase vapeur Etude expérimentale Modèle physique Modélisation Méthode Monte Carlo Potentiel polarisation Procédé dépôt Pulvérisation irradiation Simulation
- Keyword (en)
- Physical vapor deposition Experimental study Physical model Modeling Monte Carlo method Polarization potential Deposition process Sputtering Simulation
- Keyword (es)
- Modelo físico Modelización Potencial polarización Procedimiento revestimiento
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3501895
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0257-8972(94)90181-3 
https://dx.doi.org/10.1016/0257-8972(94)90181-3
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