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Synthesis of carbon nitride films by magnetically rotated arc-plasma jet chemical vapor deposition

Author
TYAN-YWAN YEN; CHANG-PIN CHOU
National Chiao Tung univ., dep.mechanical eng., Hsinchu 30050, Taiwan, Province of China
Source

Solid state communications. 1995, Vol 95, Num 5, pp 281-286 ; ref : 29 ref

CODEN
SSCOA4
ISSN
0038-1098
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier, Oxford
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
CVD Carbone nitrure Composé binaire Curium Loi Hooke SEM Spectrométrie Raman TEM
Keyword (en)
CVD Carbon nitrides Binary compounds Curium Hooke law SEM Raman spectroscopy TEM
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Pacs
8115G Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3541158

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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