Morphology of LPCVD Si3N4 films after high temperature treatment and HF etching
- Author
- BESHKOV, G; LAZAROVA, V; DIMITROV, D. B
Bulgarian acad. sci., inst. solid state physics, Sofia 1784, Bulgaria - Conference title
- Amorphous Insulating Thin Films. Partie II
- Conference name
- Amorphous Insulating Thin Films. Symposium (2 ; Strasbourg 1994-05-24) = E-MRS Spring Meeting. Symposium A (Strasbourg 1994-05-24)
- Author (monograph)
- DEVINE, Rod A. B (Editor)1 ; WARREN, W. L (Editor); KANICKI, Jerzy (Editor); MATSUMARA, Masakiyo (Editor)
European Materials Research Society, Europe (Funder/Sponsor)
[1] CNS/CNET, Meylan, France - Source
Journal of non-crystalline solids. 1995, Vol 187, pp 301-307 ; ref : 5 ref
- CODEN
- JNCSBJ
- ISSN
- 0022-3093
- Scientific domain
- Crystallography; Chemical industry parachemical industry; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Attaque chimique Basse pression CVD Composé binaire Couche mince Etude expérimentale Haute température Matériau semiconducteur Morphologie Propriété électrique Silicium nitrure Traitement surface Traitement thermique N Si Si3N4 Composé minéral
- Keyword (en)
- Chemical etching Low pressure CVD Binary compounds Thin films Experimental study High temperature Semiconductor materials Morphology Electrical properties Silicon nitrides Surface treatments Heat treatments Inorganic compounds
- Keyword (es)
- Ataque químico Alta temperatura
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3619905
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0022-3093(95)00154-9 
https://dx.doi.org/10.1016/0022-3093(95)00154-9
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