Influence of FN electron injections in dry and dry/wet/dry gate oxides : relation with failure
- Author
- CIANTAR, E1 ; BOIVIN, P1 ; BURLE, M1 ; NIEL, C1 ; MORAGUES, J. M2 ; SAGNES, B2 ; JERISIAN, R2 ; OUALID, J2
[1] SGS-Thomson Microelectronics, 13790 Rousset, France
[2] ENSPM, lab. matériaux composants semiconducteurs, 13397 Marseille, France - Conference title
- Amorphous Insulating Thin Films. Partie II
- Conference name
- Amorphous Insulating Thin Films. Symposium (2 ; Strasbourg 1994-05-24) = E-MRS Spring Meeting. Symposium A (Strasbourg 1994-05-24)
- Author (monograph)
- DEVINE, Rod A. B (Editor)1 ; WARREN, W. L (Editor); KANICKI, Jerzy (Editor); MATSUMARA, Masakiyo (Editor)
European Materials Research Society, Europe (Funder/Sponsor)
[1] CNS/CNET, Meylan, France - Source
Journal of non-crystalline solids. 1995, Vol 187, pp 144-148 ; ref : 10 ref
- CODEN
- JNCSBJ
- ISSN
- 0022-3093
- Scientific domain
- Crystallography; Chemical industry parachemical industry; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Capacité MOS Circuit intégré Essai Etude expérimentale Fiabilité Piégeage porteur charge Injection Fowler Nordheim Oxyde grille
- Keyword (en)
- MOS capacity Integrated circuits Testing Experimental study Reliability Charge carrier trapping Fowler-Nordheim injection Gate oxide
- Keyword (es)
- Capacidad MOS Estudio experimental Captura portador carga
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03B Testing, measurement, noise and reliability
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3630143
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0022-3093(95)00127-1 
https://dx.doi.org/10.1016/0022-3093(95)00127-1
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