Monitoring of SiC deposition in an industrial CVI/CVD reactor by in-situ FTIR spectroscopy
- Author
- MOSEBACH, H1 ; HOPFE, V; ERHARD, M1 ; MEYER, M
[1] Kayser-Threde GmbH, 81379 München, Germany - Conference title
- EUROCVD 10 : European conference on chemical vapour deposition
- Conference name
- EUROCVD 10 : European conference on chemical vapour deposition (10 ; Venice 1995-09-10)
- Author (monograph)
- BATTISTON, Giovanni A (Editor)1 ; GERBASI, Rosalba (Editor)1 ; PORCHIA, Marina (Editor)1
[1] CNR, Padua, Italy - Source
Journal de physique. IV. 1995, Vol 5, Num 5, pp C5.97-C5.104 ; 1 ; ref : 11 ref
- Publisher
- EDP sciences, Les Ulis
- Publication country
- France
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- CVD Commande processus Composé binaire Céramique sans oxyde Dépendance temps Etude expérimentale In situ Réacteur chimique Silicium carbure Spectre IR C Si SiC Composé minéral
- Keyword (en)
- CVD Process control Binary compounds Non oxide ceramics Time dependence Experimental study In situ Chemical reactors Silicon carbides Infrared spectra Inorganic compounds
- Keyword (es)
- Cerámica sin óxido In situ
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3650974
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:0:\"\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:90:\"Monitoring of SiC deposition in an industrial CVI\/CVD reactor by in-situ FTIR spectroscopy\";s:9:\"\u0000*\u0000jtitle\";s:23:\"Journal de physique. IV\";s:9:\"\u0000*\u0000stitle\";s:12:\"J. phys., IV\";s:7:\"\u0000*\u0000date\";s:4:\"1995\";s:9:\"\u0000*\u0000volume\";s:1:\"5\";s:8:\"\u0000*\u0000issue\";s:1:\"5\";s:8:\"\u0000*\u0000spage\";s:5:\"C5.97\";s:8:\"\u0000*\u0000epage\";s:6:\"C5.104\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1155-4339\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"MOSEBACH\";s:10:\"\u0000*\u0000aufirst\";s:1:\"H\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:8:\"HOPFE, V\";i:1;s:9:\"ERHARD, M\";i:2;s:8:\"MEYER, M\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:62:\"EUROCVD 10 : European conference on chemical vapour deposition\";s:8:\"\u0000*\u0000title\";s:90:\"Monitoring of SiC deposition in an industrial CVI\/CVD reactor by in-situ FTIR spectroscopy\";s:8:\"\u0000*\u0000place\";s:8:\"Les Ulis\";s:6:\"\u0000*\u0000pub\";s:12:\"EDP sciences\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:0:\"\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:90:\"Monitoring of SiC deposition in an industrial CVI\/CVD reactor by in-situ FTIR spectroscopy\";s:9:\"\u0000*\u0000jtitle\";s:23:\"Journal de physique. IV\";s:9:\"\u0000*\u0000stitle\";s:12:\"J. phys., IV\";s:7:\"\u0000*\u0000date\";s:4:\"1995\";s:9:\"\u0000*\u0000volume\";s:1:\"5\";s:8:\"\u0000*\u0000issue\";s:1:\"5\";s:8:\"\u0000*\u0000spage\";s:5:\"C5.97\";s:8:\"\u0000*\u0000epage\";s:6:\"C5.104\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1155-4339\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"MOSEBACH\";s:10:\"\u0000*\u0000aufirst\";s:1:\"H\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:8:\"HOPFE, V\";i:1;s:9:\"ERHARD, M\";i:2;s:8:\"MEYER, M\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:62:\"EUROCVD 10 : European conference on chemical vapour deposition\";s:8:\"\u0000*\u0000title\";s:90:\"Monitoring of SiC deposition in an industrial CVI\/CVD reactor by in-situ FTIR spectroscopy\";s:8:\"\u0000*\u0000place\";s:8:\"Les Ulis\";s:6:\"\u0000*\u0000pub\";s:12:\"EDP sciences\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:0:\"\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:90:\"Monitoring of SiC deposition in an industrial CVI\/CVD reactor by in-situ FTIR spectroscopy\";s:9:\"\u0000*\u0000jtitle\";s:23:\"Journal de physique. IV\";s:9:\"\u0000*\u0000stitle\";s:12:\"J. phys., IV\";s:7:\"\u0000*\u0000date\";s:4:\"1995\";s:9:\"\u0000*\u0000volume\";s:1:\"5\";s:8:\"\u0000*\u0000issue\";s:1:\"5\";s:8:\"\u0000*\u0000spage\";s:5:\"C5.97\";s:8:\"\u0000*\u0000epage\";s:6:\"C5.104\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1155-4339\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"MOSEBACH\";s:10:\"\u0000*\u0000aufirst\";s:1:\"H\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:8:\"HOPFE, V\";i:1;s:9:\"ERHARD, M\";i:2;s:8:\"MEYER, M\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:62:\"EUROCVD 10 : European conference on chemical vapour deposition\";s:8:\"\u0000*\u0000title\";s:90:\"Monitoring of SiC deposition in an industrial CVI\/CVD reactor by in-situ FTIR spectroscopy\";s:8:\"\u0000*\u0000place\";s:8:\"Les Ulis\";s:6:\"\u0000*\u0000pub\";s:12:\"EDP sciences\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:0:\"\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:90:\"Monitoring of SiC deposition in an industrial CVI\/CVD reactor by in-situ FTIR spectroscopy\";s:9:\"\u0000*\u0000jtitle\";s:23:\"Journal de physique. IV\";s:9:\"\u0000*\u0000stitle\";s:12:\"J. phys., IV\";s:7:\"\u0000*\u0000date\";s:4:\"1995\";s:9:\"\u0000*\u0000volume\";s:1:\"5\";s:8:\"\u0000*\u0000issue\";s:1:\"5\";s:8:\"\u0000*\u0000spage\";s:5:\"C5.97\";s:8:\"\u0000*\u0000epage\";s:6:\"C5.104\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1155-4339\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"MOSEBACH\";s:10:\"\u0000*\u0000aufirst\";s:1:\"H\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:8:\"HOPFE, V\";i:1;s:9:\"ERHARD, M\";i:2;s:8:\"MEYER, M\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:62:\"EUROCVD 10 : European conference on chemical vapour deposition\";s:8:\"\u0000*\u0000title\";s:90:\"Monitoring of SiC deposition in an industrial CVI\/CVD reactor by in-situ FTIR spectroscopy\";s:8:\"\u0000*\u0000place\";s:8:\"Les Ulis\";s:6:\"\u0000*\u0000pub\";s:12:\"EDP sciences\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:0:\"\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:90:\"Monitoring of SiC deposition in an industrial CVI\/CVD reactor by in-situ FTIR spectroscopy\";s:9:\"\u0000*\u0000jtitle\";s:23:\"Journal de physique. IV\";s:9:\"\u0000*\u0000stitle\";s:12:\"J. phys., IV\";s:7:\"\u0000*\u0000date\";s:4:\"1995\";s:9:\"\u0000*\u0000volume\";s:1:\"5\";s:8:\"\u0000*\u0000issue\";s:1:\"5\";s:8:\"\u0000*\u0000spage\";s:5:\"C5.97\";s:8:\"\u0000*\u0000epage\";s:6:\"C5.104\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1155-4339\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"MOSEBACH\";s:10:\"\u0000*\u0000aufirst\";s:1:\"H\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:8:\"HOPFE, V\";i:1;s:9:\"ERHARD, M\";i:2;s:8:\"MEYER, M\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:62:\"EUROCVD 10 : European conference on chemical vapour deposition\";s:8:\"\u0000*\u0000title\";s:90:\"Monitoring of SiC deposition in an industrial CVI\/CVD reactor by in-situ FTIR spectroscopy\";s:8:\"\u0000*\u0000place\";s:8:\"Les Ulis\";s:6:\"\u0000*\u0000pub\";s:12:\"EDP sciences\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
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