Technological versions for diffusive metallizing by the PVDM element scheme method
- Author
- SHISHKOV, R. I
Tech. univ., 7017 Rousse, Bulgaria - Source
Vacuum. 1995, Vol 46, Num 12, pp 1357-1360 ; ref : 11 ref
- CODEN
- VACUAV
- ISSN
- 0042-207X
- Scientific domain
- Metallurgy, welding; Physics
- Publisher
- Elsevier, Oxford
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Cinétique Diffusion(transport) Dépôt sous vide Etude théorique Métallisation Méthode croissance cristalline Revêtement Source plasma
- Keyword (en)
- Kinetics Diffusion Vacuum deposition Theoretical study Metallization Crystal growth methods Coatings Plasma sources
- Keyword (es)
- Depósito bajo vacío
- Keyword (de)
- Vakuumbeschichtungsverfahren
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15E Vacuum deposition
- Discipline
- Metals. Metallurgy Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3659291
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0042-207X(95)00025-9 
https://dx.doi.org/10.1016/0042-207X(95)00025-9
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