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Technological versions for diffusive metallizing by the PVDM element scheme method

Author
SHISHKOV, R. I
Tech. univ., 7017 Rousse, Bulgaria
Source

Vacuum. 1995, Vol 46, Num 12, pp 1357-1360 ; ref : 11 ref

CODEN
VACUAV
ISSN
0042-207X
Scientific domain
Metallurgy, welding; Physics
Publisher
Elsevier, Oxford
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Cinétique Diffusion(transport) Dépôt sous vide Etude théorique Métallisation Méthode croissance cristalline Revêtement Source plasma
Keyword (en)
Kinetics Diffusion Vacuum deposition Theoretical study Metallization Crystal growth methods Coatings Plasma sources
Keyword (es)
Depósito bajo vacío
Keyword (de)
Vakuumbeschichtungsverfahren
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15E Vacuum deposition

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy

Pacs
8115 Methods of deposition of films and coatings; film growth and epitaxy

Discipline
Metals. Metallurgy Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3659291

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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