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Surface segregation effects of In in GaAs

Author
DOSANJH, S. S1 ; ZHANG, X. M1 ; SANSOM, D1 ; HARRIS, J. J1 ; FAHY, M. R1 ; JOYCE, B. A1 ; CLEGG, J. B
[1] Imperial coll., Blackett lab., IRC semiconductor materials, London SW7 2BZ, United Kingdom
Source

Journal of applied physics. 1993, Vol 74, Num 4, pp 2481-2485 ; ref : 19 ref

CODEN
JAPIAU
ISSN
0021-8979
Scientific domain
Crystallography; Electronics; Optics; Condensed state physics; Physics
Publisher
American Institute of Physics, Woodbury, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Addition indium Couche mince Domaine température 400-1000 K Epitaxie jet moléculaire Etude expérimentale Gallium arséniure Impureté MET Matériau semiconducteur Photoluminescence SIMS Surface Ségrégation Composé minéral
Keyword (en)
Indium additions Thin films Temperature range 400-1000 K Molecular beam epitaxy Experimental study Gallium arsenides Impurities TEM Semiconductor materials Photoluminescence SIMS Surfaces Segregation Inorganic compounds
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35F Diffusion; interface formation

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15H Molecular, atomic, ion, and chemical beam epitaxy

Pacs
6835F Diffusion; interface formation

Discipline
Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3804668

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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