Plasma deposition of thin films from a fluorine-containing cyclosiloxane
- Author
- FAVIA, P1 ; CAPORICCIO, G; D'AGOSTINO, R1
[1] Univ. Bari, cent. studio chimie plasmi CNR, dip. chimica, 70126 Bari, Italy - Source
Journal of polymer science. Part A. Polymer chemistry. 1994, Vol 32, Num 1, pp 121-130
- CODEN
- JPLCAT
- ISSN
- 0887-624X
- Scientific domain
- Polymers, paint and wood industries
- Publisher
- Wiley, New York, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Analyse surface Couche mince Dépôt plasma Etude expérimentale Matériau revêtement Mouillabilité Polymère fluor Polymérisation décharge électrique Polymérisation ouverture cycle Propriété mécanique Préparation Relation mise en œuvre propriété Siloxane polymère Vitesse dépôt Propriété surface
- Keyword (en)
- Surface analysis Thin film Plasma deposition Experimental study Coating material Wettability Fluorine containing polymer Glow discharge polymerization Ring opening polymerization Mechanical properties Preparation Property processing relationship Siloxane polymer Deposition rate Surface properties
- Keyword (es)
- Análisis superficie Capa fina Depósito plasma Estudio experimental Material revestimiento Remojabilidad Polímero flúor Polimerización descarga eléctrica Polimerización abertura ciclo Propiedad mecánica Preparación Relación puesta en marcha propiedad Siloxano polímero Velocidad deposición Propiedad superficie
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers / 001D09B Polymers and radiations / 001D09B01 Polymerization
- Discipline
- Physical chemistry of polymers
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3856049
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1002/pola.1994.080320114 
https://dx.doi.org/10.1002/pola.1994.080320114
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