Limitations of oxide breakdown accelerated testing for reliability simulation
- Author
- NAFRIA, M; SUNE, J; AYMERICH, X
Univ. autónoma Barcelona, dep. fisica, 08193 Bellaterra, Spain - Conference title
- ESREF'92: 1992 European symposium on reliability of electron devices, failure physics and analysis
- Conference name
- ESREF'92: 1992 European symposium on reliability of electron devices, failure physics and analysis (Schwäbisch Gmünd 1992-10)
- Author (monograph)
- BERGER, H. H (Editor)1 ; GERLING, W. H (Editor)
[1] Tech. Univ. Berlin, Inst. Microelektronik, Berlin, Germany - Source
Quality and reliability engineering international. 1993, Vol 9, Num 4, pp 333-336 ; ref : 8 ref
- CODEN
- QREIE5
- ISSN
- 0748-8017
- Scientific domain
- Control theory, operational research
- Publisher
- Wiley, Chichester
- Publication country
- United Kingdom
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Amorçage Circuit intégré Couche mince Dispositif semiconducteur Diélectrique Essai accéléré Fiabilité Oxyde Technologie MOS
- Keyword (en)
- Breakdown initiation Integrated circuit Thin film Semiconductor device Dielectric materials Accelerated test Reliability Oxides MOS technology
- Keyword (es)
- Cebamiento Circuito integrado Capa fina Dispositivo semiconductor Dieléctrico Ensayo acelerado Fiabilidad Óxido Tecnología MOS
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03B Testing, measurement, noise and reliability
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3876840
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1002/qre.4680090416 
https://dx.doi.org/10.1002/qre.4680090416
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