Study of surface reflectivity and etch rates of polyimide (Kapton H) utilizing double-pulsed 308 nm laser radiation
- Author
- MIHAILOV, S1 ; DULEY, W. W
[1] CNRS Univ. Bordeaux I, lab. photophysique photochimie moléculaire, 33405 Talence, France - Source
Journal of applied physics. 1993, Vol 73, Num 5, pp 2510-2517 ; ref : 48 ref
- CODEN
- JAPIAU
- ISSN
- 0021-8979
- Scientific domain
- Crystallography; Electronics; Optics; Condensed state physics; Physics
- Publisher
- American Institute of Physics, Woodbury, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Imide polymère Propriété surface
- Keyword (en)
- Polyimide Surface properties
- Keyword (es)
- Imida polímero Propiedad superficie
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers / 001D09D Organic polymers / 001D09D04 Properties and characterization / 001D09D04H Surface properties
- Discipline
- Physical chemistry of polymers
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3895245
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1063/1.353082 
https://dx.doi.org/10.1063/1.353082
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