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Surface and depth profiling techniques using XPS applied to the study of nickel-containing environmental particles

Author
RICKMAN, J. T1 ; LINTON, R. W
[1] Hoechst Celanese Corp., Sunette div., Somerset NJ 08873, United States
Source

Applied surface science. 1993, Vol 68, Num 3, pp 375-393 ; ref : 18 ref

ISSN
0169-4332
Scientific domain
General chemistry, physical chemistry; Crystallography; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
Elsevier Science, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Keyword (fr)
Analyse chimique Analyse surface Lessivage Particule en suspension Pollution air Profil profondeur Rayon X Spectrométrie photoélectron Ni
Keyword (en)
Chemical analysis Surface analysis Leaching Suspended particle Air pollution Depth profile X ray Photoelectron spectrometry
Keyword (es)
Análisis químico Análisis superficie Lavado Partícula en suspensión Contaminación aire Perfil profundidad Rayos X Espectrometría fotoelectrón
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D16 Pollution / 001D16C Atmospheric pollution / 001D16C03 Analysis methods

Discipline
Pollution
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3905162

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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