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Stress-induced preferential alignment of basal planes in phenolic-based carbon-carbon composite

Author
JU, C. P1 ; WATAHIKI, S; TAKANO, S
[1] National Cheng-Kung univ., dep. materials eng., Tainan, Taiwan, Province of China
Source

Materials chemistry and physics. 1993, Vol 36, Num 1-2, pp 150-155 ; ref : 13 ref

CODEN
MCHPDR
ISSN
0254-0584
Scientific domain
Chemistry; Metallurgy, welding; Physics
Publisher
Elsevier, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Keyword (fr)
Carbone Contrainte compression Diffraction électron Etude expérimentale Fibre carbone Matériau composite Micropore Microscopie électronique haute tension Microscopie électronique transmission Microstructure Phénol
Keyword (en)
Carbon Compressive stress Electron diffraction Experimental study Carbon fibers Composite materials Micropore High-voltage electron microscopy Transmission electron microscopy Microstructure Phenol
Keyword (es)
Tensión compresión Microporo
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A20 Materials synthesis; materials processing

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3988765

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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