Chemical vapour deposition of high-Tc superconducting thin films
- Author
- LESKELA, M; MOLSA, H; NIINISTO, L
Univ. Helsinki, dep. chemistry, Helsinki 00014, Finland - Source
Superconductor science & technology (Print). 1993, Vol 6, Num 9, pp 627-656 ; ref : 324 ref
- ISSN
- 0953-2048
- Scientific domain
- Electronics; Condensed state physics
- Publisher
- Institute of Physics, Bristol
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Article synthèse Baryum oxyde Bismuth oxyde CVD Composé n éléments Couche mince Croissance cristalline Cuivre oxyde Etude expérimentale Précurseur Strontium oxyde Supraconducteur haute température Thallium oxyde Yttrium oxyde Ba Ca Cu O Tl Ba Cu O Y Bi Ca Cu O Sr Composé minéral Métal transition composé
- Keyword (en)
- Reviews Barium oxides Bismuth oxides CVD Multi-element compounds Thin films Crystal growth Copper oxides Experimental study Precursor Strontium oxides High-Tc superconductors Thallium oxides Yttrium oxides Inorganic compounds Transition element compounds
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 4027683
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1088/0953-2048/6/9/001 
https://dx.doi.org/10.1088/0953-2048/6/9/001
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