Particle emission induced by the interactions of highly charged slow Xe-ions with a SiO2 surface
- Author
- SCHIWIETZ, G1 ; SCHNEIDER, D; CLARK, M; SKOGVALL, B1 ; DEWITT, D; MCDONALD, J
[1] Hahn-Meitner-Inst., 1000 Berlin, Germany - Source
Radiation effects and defects in solids. 1993, Vol 127, Num 1, pp 11-14 ; ref : 5 ref
- CODEN
- REDSEI
- ISSN
- 1042-0150
- Scientific domain
- Crystallography; Metallurgy, welding; Condensed state physics
- Publisher
- Taylor and Francis, Reading
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Emission particule Etude expérimentale Faisceau ion Pulvérisation irradiation Silicium oxyde Surface O Si SiO2 Composé minéral
- Keyword (en)
- Particle emission Experimental study Ion beams Sputtering Silicon oxides Surfaces Inorganic compounds
- Keyword (es)
- Emisión partícula
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70I Electron and ion emission by liquids and solids; impact phenomena / 001B70I20 Impact phenomena (including electron spectra and sputtering) / 001B70I20R Atomic, molecular, and ion beam impact and interactions with surfaces
- Discipline
- Physics of condensed state : electronic structure, electrical, magnetic and optical properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 4034396
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1080/10420159308219893 
https://dx.doi.org/10.1080/10420159308219893
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