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Passivation of GaSb by sulfur treatment

Author
PEROTIN, M1 ; COUDRAY, P1 ; GOUSKOV, L1 ; LUQUET, H1 ; LLINARES, C1 ; BONNET, J. J2 ; SOONCKINDT, L2 3 ; LAMBERT, B
[1] Univ. Montpellier II, cent. electronique Montpellier, 34095 Montpellier, France
[2] Univ. Montpellier II, lab. études surfaces interfaces composants, 34095 Montpellier, France
[3] CNET, 22301 Lannion, France
Source

Journal of electronic materials. 1994, Vol 23, Num 1, pp 7-12 ; ref : 22 ref

CODEN
JECMA5
ISSN
0361-5235
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Institute of Electrical and Electronics Engineers, New York, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Circuit intégré Diode avalanche Diode barrière Schottky Dispositif semiconducteur Etude expérimentale Fabrication microélectronique Gallium Antimoniure Passivation Propriété optique Propriété électrique Sulfuration
Keyword (en)
Integrated circuit Avalanche diode Schottky barrier diode Semiconductor device Experimental study Microelectronic fabrication Gallium Antimonides Passivation Optical properties Electrical properties Sulfurization
Keyword (es)
Circuito integrado Diodo avalancha Diodo barrera Schottky Dispositivo semiconductor Estudio experimental Fabricación microeléctrica Galio Antimoniuro Pasivación Propiedad óptica Propiedad eléctrica Sulfurización
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
4044531

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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