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Effect of Si interlayers on stress and curvature radius of GaAs/Si and GaAs/Si/GaAs/Si heterostructures with interfacial misfit dislocations

Author
NAKAJIMA, K; FURUYA, K
Fujitsu Laboratories Ltd, ULSI crystals lab., Morinosato-Wakamiya, Atsugi 243-01, Japan
Source

Japanese journal of applied physics. 1994, Vol 33, Num 3A, pp 1420-1426 ; 1 ; ref : 29 ref

CODEN
JJAPA5
ISSN
0021-4922
Scientific domain
Crystallography; Optics; Condensed state physics; Physics; Plasma physics
Publisher
Japanese journal of applied physics, Tokyo
Publication country
Japan
Document type
Article
Language
English
Keyword (fr)
Champ contrainte Contrainte thermique Dislocation interfaciale Etude théorique Gallium arséniure Hétérostructure Matériau semiconducteur Silicium As Ga GaAs Si Composé minéral
Keyword (en)
Stress distribution Thermal stresses Misfit dislocations Theoretical study Gallium arsenides Heterostructures Semiconductor materials Silicon Inorganic compounds
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35G Mechanical and acoustical properties; adhesion

Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H65 Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties

Pacs
6835G Mechanical and acoustical properties; adhesion

Pacs
6865 Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
4060566

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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