Electroless chemical deposition technique for Cu2O thin films
- Author
- GROZDANOV, I
Arizona State univ., dep. chemical bio materials eng., Tempe AZ 85287-6006, United States - Source
Materials letters (General ed.). 1994, Vol 19, Num 5-6, pp 281-285 ; ref : 12 ref
- CODEN
- MLETDJ
- ISSN
- 0167-577X
- Scientific domain
- Crystallography; Chemical industry parachemical industry; Condensed state physics; Polymers, paint and wood industries
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Keyword (fr)
- Bande interdite Caractérisation Composé binaire Conductivité électrique Couche mince Croissance cristalline en solution Cuivre oxyde Electrodéposition Etude expérimentale Prétraitement Substrat Cu O Cu2O Composé minéral Métal transition composé
- Keyword (en)
- Energy gap Characterization Binary compounds Electric conductivity Thin films Crystal growth from solutions Copper oxides Electrodeposition Experimental study Pretreatment Substrates Inorganic compounds Transition element compounds
- Keyword (es)
- Caracterización Pretratamiento
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15P Electrodeposition, electroplating
- Pascal
- 001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01H Electrochemistry / 001C01H04 Study of interfaces / 001C01H04A Electrodeposition
- Discipline
- General chemistry and physical chemistry Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 4086383
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0167-577X(94)90171-6 
https://dx.doi.org/10.1016/0167-577X(94)90171-6
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