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On the nature and structures of different heat treatment centres in n- and p-type silicon

Author
MEILWES, N1 ; SPAETH, J. M1 ; EMTSEV, V. V; OGANESYAN, G. A
[1] Univ.-GH Paderborn, Fachbereich Physik, 33098 Paderborn, Germany
Source

Semiconductor science and technology. 1994, Vol 9, Num 7, pp 1346-1353 ; ref : 25 ref

CODEN
SSTEET
ISSN
0268-1242
Scientific domain
Electronics; Optics; Condensed state physics
Publisher
Institute of Physics, Bristol
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Addition bore Addition carbone Addition phosphore Conducteur type n Densité électron Défaut ENDOR Effet Hall Etude expérimentale Matériau dopé Matériau semiconducteur RPE Semiconducteur type P Silicium Traitement thermique Si:B C P
Keyword (en)
Boron additions Carbon additions Phosphorus additions N-type conductors Electron density Defects ENDOR Hall effect Experimental study Doped materials Semiconductor materials ESR P-type conductors Silicon Heat treatments
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70F Magnetic resonances and relaxations in condensed matter, mössbauer effect / 001B70F30 Electron paramagnetic resonance and relaxation / 001B70F30M Color centers and other defects

Pacs
7630M Color centers and other defects

Discipline
Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
4151582

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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