Suppression of cone formation on carbon target during sputtering
- Author
- HOSHI, Y1 ; SUZUKI, A; JUDY, J. H
[1] Tokyo inst. polytech., dep. electronic eng., Atsugi, Kanagawa 243-02, Japan - Source
Japanese journal of applied physics. 1994, Vol 33, Num 9A, pp 4991-4996 ; 1 ; ref : 9 ref
- CODEN
- JJAPA5
- ISSN
- 0021-4922
- Scientific domain
- Crystallography; Optics; Condensed state physics; Physics; Plasma physics
- Publisher
- Japanese journal of applied physics, Tokyo
- Publication country
- Japan
- Document type
- Article
- Language
- English
- Keyword (fr)
- Adhérence Carbone Cible Coefficient frottement Croissance cristalline en phase vapeur Croissance film Etude expérimentale Forme conique Mode opératoire Morphologie Pulvérisation cathodique Surface Trichite C Non métal
- Keyword (en)
- Adhesion Carbon Targets Friction factor Crystal growth from vapors Film growth Experimental study Conical shape Operating mode Morphology Cathode sputtering Surfaces Whiskers Nonmetals
- Keyword (es)
- Forma cónica Método operatorio
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 4251172
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1143/JJAP.33.4991 
https://dx.doi.org/10.1143/JJAP.33.4991
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