Photoemission study of the negative electron affinity surfaces of O/Cs/Si(001)2×1 and O/K/Si(001)2×1
- Autor
- ABUKAWA, T; ENTA, Y; KASHIWAKURA, T; SUZUKI, S; KONO, S; SAKAMOTO, T
Tohoku univ., fac. sci., dep. physics, Sendai 980, Japan - Fuente
Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1990, Vol 8, Num 4, pp 3205-3209 ; ref : 20 ref
- CODEN
- JVTAD6
- ISSN
- 0734-2101
- Campo Científico
- Metallurgy, welding; Physics
- Editor
- American Institute of Physics, Melville, NY
- País de la publicación
- United States
- Tipo de documento
- Article
- Idioma
- English
- Palabra clave (fr)
- Diffraction RX Microstructure Spectrométrie photoélectron Surface Affinité électronique négative Coadsorption
- Palabra clave (in)
- X ray diffraction Microstructure Photoelectron spectrometry Surface
- Palabra clave (es)
- Difracción RX Microestructura Espectrometría fotoelectrón Superficie
- Clasificación
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H90 Other topics in structure, and nonelectronic properties of surfaces and interfaces; thin films and whiskers
- Disciplina
- Physics of condensed state : structure, mechanical and thermal properties
- Procedencia
- Inist-CNRS
- Base de datos
- PASCAL
- Identificador INIST
- 4423687
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1116/1.576564 
https://dx.doi.org/10.1116/1.576564
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:16:\"10.1116\/1.576564\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:102:\"Photoemission study of the negative electron affinity surfaces of O\/Cs\/Si(001)2\u00d71 and O\/K\/Si(001)2\u00d71\";s:9:\"\u0000*\u0000jtitle\";s:72:\"Journal of vacuum science and technology. A. Vacuum, surfaces, and films\";s:9:\"\u0000*\u0000stitle\";s:42:\"J. vac. sci. technol., A, Vac. surf. films\";s:7:\"\u0000*\u0000date\";s:4:\"1990\";s:9:\"\u0000*\u0000volume\";s:1:\"8\";s:8:\"\u0000*\u0000issue\";s:1:\"4\";s:8:\"\u0000*\u0000spage\";s:4:\"3205\";s:8:\"\u0000*\u0000epage\";s:4:\"3209\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0734-2101\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"ABUKAWA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"T\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:7:\"ENTA, Y\";i:1;s:14:\"KASHIWAKURA, T\";i:2;s:9:\"SUZUKI, S\";i:3;s:7:\"KONO, S\";i:4;s:11:\"SAKAMOTO, T\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JVTAD6\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:102:\"Photoemission study of the negative electron affinity surfaces of O\/Cs\/Si(001)2\u00d71 and O\/K\/Si(001)2\u00d71\";s:8:\"\u0000*\u0000place\";s:12:\"Melville, NY\";s:6:\"\u0000*\u0000pub\";s:29:\"American Institute of Physics\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante Panist
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:16:\"10.1116\/1.576564\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:102:\"Photoemission study of the negative electron affinity surfaces of O\/Cs\/Si(001)2\u00d71 and O\/K\/Si(001)2\u00d71\";s:9:\"\u0000*\u0000jtitle\";s:72:\"Journal of vacuum science and technology. A. Vacuum, surfaces, and films\";s:9:\"\u0000*\u0000stitle\";s:42:\"J. vac. sci. technol., A, Vac. surf. films\";s:7:\"\u0000*\u0000date\";s:4:\"1990\";s:9:\"\u0000*\u0000volume\";s:1:\"8\";s:8:\"\u0000*\u0000issue\";s:1:\"4\";s:8:\"\u0000*\u0000spage\";s:4:\"3205\";s:8:\"\u0000*\u0000epage\";s:4:\"3209\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0734-2101\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"ABUKAWA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"T\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:7:\"ENTA, Y\";i:1;s:14:\"KASHIWAKURA, T\";i:2;s:9:\"SUZUKI, S\";i:3;s:7:\"KONO, S\";i:4;s:11:\"SAKAMOTO, T\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JVTAD6\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:102:\"Photoemission study of the negative electron affinity surfaces of O\/Cs\/Si(001)2\u00d71 and O\/K\/Si(001)2\u00d71\";s:8:\"\u0000*\u0000place\";s:12:\"Melville, NY\";s:6:\"\u0000*\u0000pub\";s:29:\"American Institute of Physics\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante Istex
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:16:\"10.1116\/1.576564\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Acceso mediante Unpaywall
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:16:\"10.1116\/1.576564\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:102:\"Photoemission study of the negative electron affinity surfaces of O\/Cs\/Si(001)2\u00d71 and O\/K\/Si(001)2\u00d71\";s:9:\"\u0000*\u0000jtitle\";s:72:\"Journal of vacuum science and technology. A. Vacuum, surfaces, and films\";s:9:\"\u0000*\u0000stitle\";s:42:\"J. vac. sci. technol., A, Vac. surf. films\";s:7:\"\u0000*\u0000date\";s:4:\"1990\";s:9:\"\u0000*\u0000volume\";s:1:\"8\";s:8:\"\u0000*\u0000issue\";s:1:\"4\";s:8:\"\u0000*\u0000spage\";s:4:\"3205\";s:8:\"\u0000*\u0000epage\";s:4:\"3209\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0734-2101\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"ABUKAWA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"T\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:7:\"ENTA, Y\";i:1;s:14:\"KASHIWAKURA, T\";i:2;s:9:\"SUZUKI, S\";i:3;s:7:\"KONO, S\";i:4;s:11:\"SAKAMOTO, T\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JVTAD6\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:102:\"Photoemission study of the negative electron affinity surfaces of O\/Cs\/Si(001)2\u00d71 and O\/K\/Si(001)2\u00d71\";s:8:\"\u0000*\u0000place\";s:12:\"Melville, NY\";s:6:\"\u0000*\u0000pub\";s:29:\"American Institute of Physics\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante Europe PubMed Central
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:16:\"10.1116\/1.576564\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:102:\"Photoemission study of the negative electron affinity surfaces of O\/Cs\/Si(001)2\u00d71 and O\/K\/Si(001)2\u00d71\";s:9:\"\u0000*\u0000jtitle\";s:72:\"Journal of vacuum science and technology. A. Vacuum, surfaces, and films\";s:9:\"\u0000*\u0000stitle\";s:42:\"J. vac. sci. technol., A, Vac. surf. films\";s:7:\"\u0000*\u0000date\";s:4:\"1990\";s:9:\"\u0000*\u0000volume\";s:1:\"8\";s:8:\"\u0000*\u0000issue\";s:1:\"4\";s:8:\"\u0000*\u0000spage\";s:4:\"3205\";s:8:\"\u0000*\u0000epage\";s:4:\"3209\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0734-2101\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"ABUKAWA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"T\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:7:\"ENTA, Y\";i:1;s:14:\"KASHIWAKURA, T\";i:2;s:9:\"SUZUKI, S\";i:3;s:7:\"KONO, S\";i:4;s:11:\"SAKAMOTO, T\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JVTAD6\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:102:\"Photoemission study of the negative electron affinity surfaces of O\/Cs\/Si(001)2\u00d71 and O\/K\/Si(001)2\u00d71\";s:8:\"\u0000*\u0000place\";s:12:\"Melville, NY\";s:6:\"\u0000*\u0000pub\";s:29:\"American Institute of Physics\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante Base Search
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:16:\"10.1116\/1.576564\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:102:\"Photoemission study of the negative electron affinity surfaces of O\/Cs\/Si(001)2\u00d71 and O\/K\/Si(001)2\u00d71\";s:9:\"\u0000*\u0000jtitle\";s:72:\"Journal of vacuum science and technology. A. Vacuum, surfaces, and films\";s:9:\"\u0000*\u0000stitle\";s:42:\"J. vac. sci. technol., A, Vac. surf. films\";s:7:\"\u0000*\u0000date\";s:4:\"1990\";s:9:\"\u0000*\u0000volume\";s:1:\"8\";s:8:\"\u0000*\u0000issue\";s:1:\"4\";s:8:\"\u0000*\u0000spage\";s:4:\"3205\";s:8:\"\u0000*\u0000epage\";s:4:\"3209\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0734-2101\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"ABUKAWA\";s:10:\"\u0000*\u0000aufirst\";s:1:\"T\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:7:\"ENTA, Y\";i:1;s:14:\"KASHIWAKURA, T\";i:2;s:9:\"SUZUKI, S\";i:3;s:7:\"KONO, S\";i:4;s:11:\"SAKAMOTO, T\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JVTAD6\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:102:\"Photoemission study of the negative electron affinity surfaces of O\/Cs\/Si(001)2\u00d71 and O\/K\/Si(001)2\u00d71\";s:8:\"\u0000*\u0000place\";s:12:\"Melville, NY\";s:6:\"\u0000*\u0000pub\";s:29:\"American Institute of Physics\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante arXiv
