Formation of hexafluorosilicate on Si surface treated in NH4F investigated by photoemission and surface infrared spectroscopy
- Author
- NIWANO, M; KURITA, K; TAKEDA, Y; MIYAMOTO, N
Tohoku univ., res. inst. electrical communication, Sendai 980, Japan - Source
Applied physics letters. 1993, Vol 62, Num 9, pp 1003-1005 ; ref : 16 ref
- CODEN
- APPLAB
- ISSN
- 0003-6951
- Scientific domain
- Crystallography; Electronics; Optics; Condensed state physics
- Publisher
- American Institute of Physics, Melville, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Attaque chimique Etude expérimentale Mode liaison Réaction chimique Réaction surface Semiconducteur Silicium Solution basique Spectre IR Spectrométrie photoélectron Surface Traitement surface Ammonium hexafluorosilicate Non métal
- Keyword (en)
- Chemical etching Experimental study Binding mode Chemical reaction Surface reaction Semiconductor materials Silicon Basic solution Infrared spectrum Photoelectron spectrometry Surface Surface treatment Non metal
- Keyword (es)
- Ataque químico Estudio experimental Modo de enlace Reacción química Reacción superficie Semiconductor(material) Silicio Solución básica Espectro IR Espectrometría fotoelectrón Superficie Tratamiento superficie No metal
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35G Mechanical and acoustical properties; adhesion
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H45 Solid-fluid interfaces
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 4573627
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1063/1.108562 
https://dx.doi.org/10.1063/1.108562
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