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Fabrication methods for an AlGaAs/InGaP/AlGaAs visible laser with transverse junction stripe structure grown by liquid phase epitaxy

Author
CHANG, L. B; SHAI, L. Z
Chung-Cheng inst. technology, dep. electrical eng., Taoyuan 33509, Taiwan, Province of China
Source

Solid-state electronics. 1993, Vol 36, Num 7, pp 1049-1054 ; ref : 14 ref

ISSN
0038-1101
Scientific domain
Electronics
Publisher
Elsevier Science, Oxford
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Aluminium Gallium Arséniure Mixte Amélioration Caractéristique fonctionnement Epitaxie Fabrication Gallium Indium Phosphure Mixte Hétérojonction double Laser injection Laser semiconducteur Méthode phase liquide
Keyword (en)
Aluminium Gallium Arsenides Mixed Improvement Performance characteristic Epitaxy Manufacturing Gallium Indium Phosphides Mixed Double heterojunction Injection laser Semiconductor laser Growth from liquid
Keyword (es)
Aluminio Galio Arseniuro Mixto Mejoría Característica funcionamiento Epitaxia Fabricación Galio Indio Fosfuro Mixto Heterounión doble Laser inyección Laser semiconductor Método fase líquida
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B55 Lasers / 001B40B55P Semiconductor lasers; laser diodes

Discipline
Physics : optics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
4848468

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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