A study of silicide formation from LPCVD-tungsten films : film texture and growth kinetics
- Author
- ZHANG, S-L; BUCHTA, R; ÖSTLING, R
Swedish inst. microelectronics, Kista 164 21, Sweden - Source
Journal of materials research. 1991, Vol 6, Num 9, pp 1886-1891 ; ref : 32 ref
- CODEN
- JMREEE
- ISSN
- 0884-2914
- Scientific domain
- Metallurgy, welding; Condensed state physics
- Publisher
- Materials Research Society, Warrendale, PA
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Basse pression Cinétique Couche mince Croissance cristalline Diffraction RX Dépôt chimique phase vapeur Etude expérimentale Recuit Texture Tungstène Siliciure Tungstène Métal transition Composé
- Keyword (en)
- Low pressure Kinetics Thin film Crystal growth X ray diffraction Chemical vapor deposition Experimental study Annealing Texture Tungsten Silicides Tungsten Transition metal Compounds
- Keyword (es)
- Baja presión Cinética Capa fina Crecimiento cristalino Difracción RX Depósito químico fase vapor Estudio experimental Recocido Textura Wolframio Siliciuro Wolframio Metal transición Compuesto
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35J Surface and interface dynamics and vibrations
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 4946333
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1557/JMR.1991.1886 
https://dx.doi.org/10.1557/JMR.1991.1886
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