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Adhesion of gold and nickel films to gallium arsenide

Author
GOL'DBERG, YU. A; DZHAMANBALIN, K. K; DMITRIEV, A. G; MAZO, I. B; POSSE, E. A; TSARENKOV, B. V; SHUL'GA, M. I
Acad. sci. USSR, A. F. Ioffe physicotech. inst., Leningrad, Ussr
Source

Soviet physics. Technical physics. 1990, Vol 35, Num 11, pp 1357-1358 ; ref : 5 ref

ISSN
0038-5662
Scientific domain
Physics
Publisher
American Institute of Physics, New York, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Adhésivité Composé minéral Couche mince Dépôt chimique phase vapeur Etude expérimentale Gallium Arséniure Méthode phase vapeur Nickel Or Préparation Support Traitement surface Métal transition
Keyword (en)
Adhesivity Inorganic compound Thin film Chemical vapor deposition Experimental study Gallium Arsenides Growth from vapor Nickel Gold Preparation Support Surface treatment Transition metal
Keyword (es)
Adhesividad Compuesto inorgánico Capa fina Depósito químico fase vapor Estudio experimental Galio Arseniuro Método fase vapor Niquel Oro Preparación Soporte Tratamiento superficie Metal transición
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35M Surface energy; thermodynamic properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
4993217

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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