The role of ion-induced substrate damage in thin film adhesion strength
- Author
- CAILLER, M; LEE, G. H; SCHULTZ, P. J; SIMPSON, P. J; PERQUIN, P
ISITEM Univ. Nantes, lab. sci. surfaces interfaces mécanique, 44087 Nantes, France - Source
Journal of adhesion science and technology. 1991, Vol 5, Num 11, pp 973-985 ; ref : 21 ref
- CODEN
- JATEE8
- ISSN
- 0169-4243
- Scientific domain
- Polymers, paint and wood industries
- Publisher
- Brill, Leiden
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Keyword (fr)
- Acier inoxydable Adhérence Annihilation positon Couche mince Essai rayage Etude expérimentale Faisceau ionique Interface Irradiation Microscopie électronique balayage Revêtement non métallique Silicium Oxyde Spectrométrie Auger
- Keyword (en)
- Stainless steel Adhesion Positron annihilation Thin film Scratching test Experimental study Ion beam Interface Irradiation Scanning electron microscopy Non metal coating Silicon Oxides Auger electron spectrometry
- Keyword (es)
- Acero inoxidable Adherencia Aniquilación positón Capa fina Ensayo al rayado Estudio experimental Haz iónico Interfase Irradiación Microscopía electrónica barrido Revestimiento no metálico Silicio Óxido Espectrometría Auger
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11G Mechanical properties and methods of testing. Rheology. Fracture mechanics. Tribology / 001D11G07 Other mechanical properties
- Discipline
- Metals. Metallurgy
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 4996265
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1163/156856191X00882 
https://dx.doi.org/10.1163/156856191X00882
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