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Adhesion enhancement of magnetron-sputtered copper films by ion bombardment etching treatment of nickel and Inconel substrates : investigations by Auger electron spectroscopy and secondary ion mass spectroscopy of the ion beam effects

Author
CAHOREAU, M1 ; LEE, G. H; CAISSO, J; CAILLER, M2
[1] CNRS Univ. Poitiers, lab. métallurgie physique, 86022 Poitiers, France
[2] ISITEM Univ. Nantes, lab. sci. surfaces interfaces mécanique, 44087 Nantes, France
Source

Journal of adhesion science and technology. 1991, Vol 5, Num 11, pp 987-999 ; ref : 37 ref

CODEN
JATEE8
ISSN
0169-4243
Scientific domain
Polymers, paint and wood industries
Publisher
Brill, Leiden
Publication country
Netherlands
Document type
Article
Language
English
Keyword (fr)
Adhérence Couche mince Cuivre Essai rayage Etude expérimentale Faisceau ionique Irradiation Microscopie électronique balayage Métal transition Alliage Métal transition Nickel Alliage Nickel Chrome Fer Alliage Nickel Revêtement métallique Spectrométrie Auger Spectrométrie SIMS Inconel600
Keyword (en)
Adhesion Thin film Copper Scratching test Experimental study Ion beam Irradiation Scanning electron microscopy Transition metal Alloys Transition metal Nickel Alloys Nickel Chromium Iron Alloys Nickel Metal coating Auger electron spectrometry Secondary ion mass spectrometry
Keyword (es)
Adherencia Capa fina Cobre Ensayo al rayado Estudio experimental Haz iónico Irradiación Microscopía electrónica barrido Metal transición Aleación Metal transición Niquel Aleación Niquel Cromo Hierro Aleación Niquel Revestimiento metálico Espectrometría Auger Espectrometría SIMS
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11G Mechanical properties and methods of testing. Rheology. Fracture mechanics. Tribology / 001D11G07 Other mechanical properties

Discipline
Metals. Metallurgy
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
4996266

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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