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Adhesion of hydrogenated amorphous carbon films on silicon substrates and its enhancement

Author
WANG, M; JIANG, X; STRITZKER, B
Inst. schicht- ionentech., Froschungszent. Jülich, Jülich 5170, Germany
Source

Thin solid films. 1991, Vol 197, Num 1-2, pp 57-66 ; ref : 21 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Keyword (fr)
Adhérence Carbone Essai rayage Etat amorphe Etude expérimentale Hydrogène Impureté
Keyword (en)
Adhesion Carbon Scratching test Amorphous state Experimental study Hydrogen Impurity
Keyword (es)
Adherencia Carbono Ensayo al rayado Estado amorfo Estudio experimental Hidrógeno Impureza
Keyword (de)
Adhaesion Kohlenstoff Amorpher Zustand Experimentelle Untersuchung Wasserstoff Begleitelement
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11G Mechanical properties and methods of testing. Rheology. Fracture mechanics. Tribology / 001D11G07 Other mechanical properties

Discipline
Metals. Metallurgy
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
5023969

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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