Chemical vapour deposition of metal silicides in silicon microelectronics
- Author
- MADAR, R1 ; BERNARD, C2
[1] INPG, ENSPG, LMGP, Saint Martin d'Hères 38402, France
[2] INPG, ENSEEG, LTPCM, Saint Martin d'Hères 38402, France - Conference title
- Fourth European workshop on refractory metals and silicides : selected papers, Saltsjöbaden, Sweden, March 24-27, 1991
- Conference name
- RMS 1991 [Refractory metals and silicides]. European workshop (4 ; Saltsjöbaden 1991-03-24)
- Author (monograph)
- ÖSTLING, Mikael (Editor); PETERSSON, Sture (Editor)
Royal Institute of Technology, Stockholm, Sweden (Funder/Sponsor)
IEEE. Electron Devices Society, New York NY, United States (Funder/Sponsor)
Royal inst. technology, Stockholm, Sweden - Source
Applied surface science. 1991, Vol 53, pp 1-10 ; ref : 31 ref
- Publisher
- Elsevier Science, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35J Surface and interface dynamics and vibrations
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 5033627
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0169-4332(91)90234-B 
https://dx.doi.org/10.1016/0169-4332(91)90234-B
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