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A phenomenological model of ion-induced crystallization and amorphization

Author
CARTER, G; NOBES, M. J
Univ. Salford, dep. electronic electrical eng., Salford M5 4WT, United Kingdom
Source

Journal of materials research. 1991, Vol 6, Num 10, pp 2103-2108 ; ref : 33 ref

CODEN
JMREEE
ISSN
0884-2914
Scientific domain
Metallurgy, welding; Condensed state physics
Publisher
Materials Research Society, Warrendale, PA
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Amorphisation Couche mince Cristallisation Epitaxie Etat amorphe Ion Irradiation Modèle phénoménologique Recristallisation Semiconducteur
Keyword (en)
Amorphization Thin film Crystallization Epitaxy Amorphous state Ions Irradiation Phenomenological model Recrystallization Semiconductor materials
Keyword (es)
Amorfización Capa fina Cristalización Epitaxia Estado amorfo Ión Irradiación Modelo fenomenológico Recristalización Semiconductor(material)
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35J Surface and interface dynamics and vibrations

Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
5045697

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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