A photoelectrochemical method for the thickness measurements of Cu2S film on a copper surface
- Author
- LIN LUO1 ; JIGAO ZHANG; SHENGMIN CAI; LIANYONG SU; JUIJUN ZHANG
[1] Beijing univ. posts telecommunications, mechanical eng. dep., Beijing 100088, China - Source
Journal of electroanalytical chemistry and interfacial electrochemistry. 1991, Vol 316, Num 1-2, pp 341-345 ; ref : 10 ref
- CODEN
- JEIEBC
- ISSN
- 0022-0728
- Scientific domain
- General chemistry, physical chemistry; Metallurgy, welding
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Keyword (fr)
- Cuivre I Sulfure Cuivre Electrode Epaisseur Etude expérimentale Matériau modifié Passivation Photoélectrochimie Potassium Chlorure Solution aqueuse Métal transition
- Keyword (en)
- Copper I Sulfides Copper Electrodes Thickness Experimental study Modified material Passivation Photoelectrochemistry Potassium Chlorides Aqueous solution Transition metal
- Keyword (es)
- Cobre I Sulfuro Cobre Electrodo Espesor Estudio experimental Material modificado Pasivación Fotoelectroquímica Potasio Cloruro Solución acuosa Metal transición
- Classification
- Pascal
- 001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01H Electrochemistry / 001C01H07 Photoelectrochemistry. Electrochemiluminescence
- Discipline
- General chemistry and physical chemistry
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 5111817
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0022-0728(91)87058-C 
https://dx.doi.org/10.1016/0022-0728(91)87058-C
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