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Photoinduced acid-catalyzed SiO2 formation at the polymer surface by chemical vapor deposition

Author
SHIRAI, M; HAYASHI, M; TSUNOOKA, M
Univ. Osaka Prefecture, coll. eng., dep. applied chemistry, Sakai, Osaka 591, Japan
Source

Macromolecules. 1992, Vol 25, Num 1, pp 195-200 ; ref : 28 ref

CODEN
MAMOBX
ISSN
0024-9297
Scientific domain
Polymers, paint and wood industries
Publisher
American Chemical Society, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Catalyse acide Cinétique Copolymère photosensible Dépôt chimique phase vapeur Etude expérimentale Hydrolyse Méthacrylate copolymère Rayonnement UV Réaction gaz solide Réaction surface Silane organique Silicate organique Silice Styrènesulfonate copolymère Styrèneiminosulfonate copolymère
Keyword (en)
Acid catalysis Kinetics Light sensitive copolymer Chemical vapor deposition Experimental study Hydrolysis Methacrylate copolymer Ultraviolet radiation Gas solid reaction Surface reaction Organic silane Organic silicate Silica Styrenesulfonate copolymer
Keyword (es)
Catálisis ácida Cinética Copolímero fotosensible Depósito químico fase vapor Estudio experimental Hidrólisis Metacrilato copolímero Radiación ultravioleta Reacción gas sólido Reacción superficie Silano orgánico Silicato orgánico Sílice Estireno sulfonato copolímero
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers / 001D09B Polymers and radiations / 001D09B04 Properties and characterization

Discipline
Physical chemistry of polymers
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
5169942

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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