Plasma properties in a planar d.c. magnetron sputtering device
- Author
- BINGSEN, H; ZHOU, C
Lanzhou inst. physics, Lanzhou, China - Source
Surface & coatings technology. 1992, Vol 50, Num 2, pp 111-116 ; ref : 8 ref
- CODEN
- SCTEEJ
- ISSN
- 0257-8972
- Scientific domain
- General chemistry, physical chemistry; Metallurgy, welding
- Publisher
- Elsevier, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Keyword (fr)
- Application plasma Caractéristique plasma Configuration plane Courant continu Densité électron Etude expérimentale Magnétron Pulvérisation irradiation Sonde électrostatique
- Keyword (en)
- Plasma application Plasma characteristic Plane configuration Direct current Electron density Experimental study Magnetron Sputtering Electrostatic probe
- Keyword (es)
- Aplicación plasma Característica plasma Configuración plana Corriente contínua Densidad electrón Estudio experimental Magnetrón Pulverización irradiación Sonda electrostática
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B75 Plasma devices
- Discipline
- Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 5226685
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0257-8972(92)90051-B 
https://dx.doi.org/10.1016/0257-8972(92)90051-B
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