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Electrical and structural properties of low resistivity tin-doped indium oxide films

Author
SHIGESATO, Y; TAKAKI, S; HARANOH, T
Asahi Glass Co. Ltd, advanced glass R&D cent., Yokohama-shi, Kanagawa 221, Japan
Source

Journal of applied physics. 1992, Vol 71, Num 7, pp 3356-3364 ; ref : 24 ref

CODEN
JAPIAU
ISSN
0021-8979
Scientific domain
Crystallography; Electronics; Optics; Condensed state physics; Physics
Publisher
American Institute of Physics, Woodbury, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Composé minéral Concentration porteur charge Conductivité électrique Couche mince Diffraction RX Etain Etude expérimentale Evaporation bombardement électronique Grosseur grain Indium Oxyde Microstructure Mobilité porteur charge Plasma Pulvérisation cathodique Recuit thermique
Keyword (en)
Inorganic compound Charge carrier concentration Electrical conductivity Thin film X ray diffraction Tin Experimental study Electron bombardment evaporation Grain size Indium Oxides Microstructure Charge carrier mobility Plasma Cathodic sputtering Thermal annealing
Keyword (es)
Compuesto inorgánico Concentración portador carga Conductividad eléctrica Capa fina Difracción RX Estaño Estudio experimental Evaporación bombardeo electrónico Grosor grano Indio Óxido Microestructura Movilidad portador carga Plasma Pulverización catódica Recocido térmico
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70C Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures / 001B70C50 Electronic transport phenomena in thin films and low-dimensional structures

Discipline
Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
5230932

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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