Polycrystalline TiN films deposited by reactive bias magnetron sputtering : effects of ion bombardment on resputtering rates, film composition, and microstructure
- Author
- PETROV, I1 ; HULTMAN, L; SUNDGREN, J.-E; GREENE, J. E
[1] Linkο#79ping univ., dep. physics, thin film div., 58183 Linkο#79ping, Sweden - Source
Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1992, Vol 10, Num 2, pp 265-272 ; ref : 38 ref
- CODEN
- JVTAD6
- ISSN
- 0734-2101
- Scientific domain
- Metallurgy, welding; Physics
- Publisher
- American Institute of Physics, Melville, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Atmosphère contrôlée Cinétique Composition chimique Composé minéral Couche mince Croissance cristalline Diffraction RX Défaut Etude expérimentale Faisceau ionique Irradiation Joint grain Microscopie électronique transmission Microstructure Méthode phase vapeur Paramètre cristallin Polycristal Pulvérisation haute fréquence Rétrodiffusion Rutherford Titane Nitrure Métal transition Composé
- Keyword (en)
- Controlled atmosphere Kinetics Chemical composition Inorganic compound Thin film Crystal growth X ray diffraction Defect Experimental study Ion beam Irradiation Grain boundary Transmission electron microscopy Microstructure Growth from vapor Lattice parameters Polycrystal Radiofrequency sputtering Rutherford backscattering Titanium Nitrides Transition metal Compounds
- Keyword (es)
- Atmósfera controlada Cinética Composición química Compuesto inorgánico Capa fina Crecimiento cristalino Difracción RX Defecto Estudio experimental Haz iónico Irradiación Limite grano Microscopía electrónica transmisión Microestructura Método fase vapor Parámetro cristalino Policristal Pulverización alta frecuencia Retrodifusión Rutherford Titanio Nitruro Metal transición Compuesto
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35J Surface and interface dynamics and vibrations
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 5247259
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Access to the document
Install on your browser
DOI
10.1116/1.578074 
https://dx.doi.org/10.1116/1.578074
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:16:\"10.1116\/1.578074\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:162:\"Polycrystalline TiN films deposited by reactive bias magnetron sputtering : effects of ion bombardment on resputtering rates, film composition, and microstructure\";s:9:\"\u0000*\u0000jtitle\";s:72:\"Journal of vacuum science and technology. A. Vacuum, surfaces, and films\";s:9:\"\u0000*\u0000stitle\";s:42:\"J. vac. sci. technol., A, Vac. surf. films\";s:7:\"\u0000*\u0000date\";s:4:\"1992\";s:9:\"\u0000*\u0000volume\";s:2:\"10\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"265\";s:8:\"\u0000*\u0000epage\";s:3:\"272\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0734-2101\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"PETROV\";s:10:\"\u0000*\u0000aufirst\";s:1:\"I\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:10:\"HULTMAN, L\";i:1;s:14:\"SUNDGREN, J.-E\";i:2;s:12:\"GREENE, J. E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JVTAD6\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:162:\"Polycrystalline TiN films deposited by reactive bias magnetron sputtering : effects of ion bombardment on resputtering rates, film composition, and microstructure\";s:8:\"\u0000*\u0000place\";s:12:\"Melville, NY\";s:6:\"\u0000*\u0000pub\";s:29:\"American Institute of Physics\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:16:\"10.1116\/1.578074\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:162:\"Polycrystalline TiN films deposited by reactive bias magnetron sputtering : effects of ion bombardment on resputtering rates, film composition, and microstructure\";s:9:\"\u0000*\u0000jtitle\";s:72:\"Journal of vacuum science and technology. A. Vacuum, surfaces, and films\";s:9:\"\u0000*\u0000stitle\";s:42:\"J. vac. sci. technol., A, Vac. surf. films\";s:7:\"\u0000*\u0000date\";s:4:\"1992\";s:9:\"\u0000*\u0000volume\";s:2:\"10\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"265\";s:8:\"\u0000*\u0000epage\";s:3:\"272\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0734-2101\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"PETROV\";s:10:\"\u0000*\u0000aufirst\";s:1:\"I\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:10:\"HULTMAN, L\";i:1;s:14:\"SUNDGREN, J.-E\";i:2;s:12:\"GREENE, J. E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JVTAD6\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:162:\"Polycrystalline TiN films deposited by reactive bias magnetron sputtering : effects of ion bombardment on resputtering rates, film composition, and microstructure\";s:8:\"\u0000*\u0000place\";s:12:\"Melville, NY\";s:6:\"\u0000*\u0000pub\";s:29:\"American Institute of Physics\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:16:\"10.1116\/1.578074\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:16:\"10.1116\/1.578074\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:162:\"Polycrystalline TiN films deposited by reactive bias magnetron sputtering : effects of ion bombardment on resputtering rates, film composition, and microstructure\";s:9:\"\u0000*\u0000jtitle\";s:72:\"Journal of vacuum science and technology. A. Vacuum, surfaces, and films\";s:9:\"\u0000*\u0000stitle\";s:42:\"J. vac. sci. technol., A, Vac. surf. films\";s:7:\"\u0000*\u0000date\";s:4:\"1992\";s:9:\"\u0000*\u0000volume\";s:2:\"10\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"265\";s:8:\"\u0000*\u0000epage\";s:3:\"272\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0734-2101\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"PETROV\";s:10:\"\u0000*\u0000aufirst\";s:1:\"I\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:10:\"HULTMAN, L\";i:1;s:14:\"SUNDGREN, J.-E\";i:2;s:12:\"GREENE, J. E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JVTAD6\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:162:\"Polycrystalline TiN films deposited by reactive bias magnetron sputtering : effects of ion bombardment on resputtering rates, film composition, and microstructure\";s:8:\"\u0000*\u0000place\";s:12:\"Melville, NY\";s:6:\"\u0000*\u0000pub\";s:29:\"American Institute of Physics\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:16:\"10.1116\/1.578074\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:162:\"Polycrystalline TiN films deposited by reactive bias magnetron sputtering : effects of ion bombardment on resputtering rates, film composition, and microstructure\";s:9:\"\u0000*\u0000jtitle\";s:72:\"Journal of vacuum science and technology. A. Vacuum, surfaces, and films\";s:9:\"\u0000*\u0000stitle\";s:42:\"J. vac. sci. technol., A, Vac. surf. films\";s:7:\"\u0000*\u0000date\";s:4:\"1992\";s:9:\"\u0000*\u0000volume\";s:2:\"10\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"265\";s:8:\"\u0000*\u0000epage\";s:3:\"272\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0734-2101\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"PETROV\";s:10:\"\u0000*\u0000aufirst\";s:1:\"I\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:10:\"HULTMAN, L\";i:1;s:14:\"SUNDGREN, J.-E\";i:2;s:12:\"GREENE, J. E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JVTAD6\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:162:\"Polycrystalline TiN films deposited by reactive bias magnetron sputtering : effects of ion bombardment on resputtering rates, film composition, and microstructure\";s:8:\"\u0000*\u0000place\";s:12:\"Melville, NY\";s:6:\"\u0000*\u0000pub\";s:29:\"American Institute of Physics\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:16:\"10.1116\/1.578074\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:162:\"Polycrystalline TiN films deposited by reactive bias magnetron sputtering : effects of ion bombardment on resputtering rates, film composition, and microstructure\";s:9:\"\u0000*\u0000jtitle\";s:72:\"Journal of vacuum science and technology. A. Vacuum, surfaces, and films\";s:9:\"\u0000*\u0000stitle\";s:42:\"J. vac. sci. technol., A, Vac. surf. films\";s:7:\"\u0000*\u0000date\";s:4:\"1992\";s:9:\"\u0000*\u0000volume\";s:2:\"10\";s:8:\"\u0000*\u0000issue\";s:1:\"2\";s:8:\"\u0000*\u0000spage\";s:3:\"265\";s:8:\"\u0000*\u0000epage\";s:3:\"272\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0734-2101\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"PETROV\";s:10:\"\u0000*\u0000aufirst\";s:1:\"I\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:3:{i:0;s:10:\"HULTMAN, L\";i:1;s:14:\"SUNDGREN, J.-E\";i:2;s:12:\"GREENE, J. E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"JVTAD6\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:162:\"Polycrystalline TiN films deposited by reactive bias magnetron sputtering : effects of ion bombardment on resputtering rates, film composition, and microstructure\";s:8:\"\u0000*\u0000place\";s:12:\"Melville, NY\";s:6:\"\u0000*\u0000pub\";s:29:\"American Institute of Physics\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
arXiv access
