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Poly(4-methylstyren-co-chloromethylstyrene) : a negative electron beam resist : synthesis and lithography evaluation

Author
AFFROSSMAN, S1 ; MASSOUD BAKSHAEE; PETHRICK, R. A; BRAMLEY, D; FONG CHOW; DIX, C; HENDY, P; JONES, M; LEDWITH, A; MILLS, M; MILLER TATE, P
[1] Univ. Strathclyde, dep. pure applied chemistry, Glasgow G1 1XL, United Kingdom
Source

Polymer international. 1992, Vol 28, Num 3, pp 209-217 ; ref : 24 ref

ISSN
0959-8103
Scientific domain
Polymers, paint and wood industries
Publisher
Wiley, Chichester
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Copolymérisation masse Copolymérisation radicalaire Effet solvant Electrorésist Etude expérimentale Limite résolution Lithographie faisceau électron Préparation Rapport réactivité Relation composition propriété Relation masse moléculaire propriété Resist négatif Sensibilité Styrène(chlorométhyl) copolymère Styrène(méthyl) copolymère Résistance gravure plasma
Keyword (en)
Mass copolymerization Radical copolymerization Solvent effect Electroresist Experimental study Resolving power Electron beam lithography Preparation Reactivity ratio Property composition relationship Molecular weight property relation Negative resist Sensitivity Styrene(chloromethyl) copolymer Styrene(methyl) copolymer
Keyword (es)
Copolimerización masa Copolimerización radical Efecto solvente Polímero electrosensible Estudio experimental Poder resolución Litografía haz electrón Preparación Relación reactividad Relación composición propiedad Relación masa molecular propiedad Resistencia negativa Sensibilidad Estireno(clorometil) copolímero Estireno(metil) copolímero
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers / 001D09D Organic polymers / 001D09D02 Preparation, kinetics, thermodynamics, mechanism and catalysts / 001D09D02E Polymers with particular properties

Discipline
Physical chemistry of polymers
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
5283953

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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