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Pore morphology and the mechanism of pore formation in n-type silicon

Author
SEARSON, P. C1 ; MACAULAY, J. M; ROSS, F. M
[1] Johns Hopkins univ., dep. materials sci. eng., Baltimore MD 21218, United States
Source

Journal of applied physics. 1992, Vol 72, Num 1, pp 253-258 ; ref : 27 ref

CODEN
JAPIAU
ISSN
0021-8979
Scientific domain
Crystallography; Electronics; Optics; Condensed state physics; Physics
Publisher
American Institute of Physics, Woodbury, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Dissolution électrolytique Décroissance cristalline Etude expérimentale Matériau poreux Morphologie Non métal Orientation cristalline Propagation Semiconducteur Silicium
Keyword (en)
Electrodissolution Inverse crystal growth Experimental study Porous material Morphology Non metal Crystal orientation Propagation Semiconductor materials Silicon
Keyword (es)
Disolución electrolitica Decrecimiento cristalino Estudio experimental Material poroso Morfología No metal Orientación cristalina Propagación Semiconductor(material) Silicio
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35G Mechanical and acoustical properties; adhesion

Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H45 Solid-fluid interfaces

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
5359174

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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