Dynamic thermal distortions in an X-ray mask membrane during pulsed X-ray exposure
- Author
- CHIBA, A; OKADA, K
Sortec Corp., Tsukuba-shi, Ibaraki 300-42, Japan - Source
Japanese journal of applied physics. 1990, Vol 29, Num 11, pp 2610-2615 ; 1 ; ref : 9 ref
- CODEN
- JJAPA5
- ISSN
- 0021-4922
- Scientific domain
- Crystallography; Optics; Condensed state physics; Physics; Plasma physics
- Publisher
- Japanese journal of applied physics, Tokyo
- Publication country
- Japan
- Document type
- Article
- Language
- English
- Keyword (fr)
- Distorsion Fabrication microélectronique Lithographie Masque Rayon X Distorsion thermique Rayon X pulsé
- Keyword (en)
- Distortion Microelectronic fabrication Lithography Mask X ray
- Keyword (es)
- Distorsión Fabricación microeléctrica Litografía Máscara Rayos X
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
- Discipline
- Electronics Physics of condensed state : electronic structure, electrical, magnetic and optical properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 5421765
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1143/JJAP.29.2610 
https://dx.doi.org/10.1143/JJAP.29.2610
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