A review of the properties of aluminium alloy films used during silicon device fabrication
- Author
- WILSON, R. J; WEISS, B. L
Univ. Surrey, dep. electronic electrical eng., Guildford Surrey GU2 5XH, United Kingdom - Source
Vacuum. 1991, Vol 42, Num 12, pp 719-729 ; ref : 98 ref
- CODEN
- VACUAV
- ISSN
- 0042-207X
- Scientific domain
- Metallurgy, welding; Physics
- Publisher
- Elsevier, Oxford
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Article synthèse Dépôt Electrodiffusion Fabrication microélectronique Microstructure Métallisation Propriété mécanique Propriété thermique Propriété électrique Réflectivité Aluminium
- Keyword (en)
- Review Deposition Electrodiffusion Microelectronic fabrication Microstructure Metallizing Mechanical properties Thermal properties Electrical properties Reflectivity
- Keyword (es)
- Artículo síntesis Depósito Electrodifusión Fabricación microeléctrica Microestructura Metalización Propiedad mecánica Propiedad térmica Propiedad eléctrica Reflectividad
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 5437264
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0042-207X(91)90167-H 
https://dx.doi.org/10.1016/0042-207X(91)90167-H
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