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Plasma etching of Ti in fluorine-containing feeds

Author
D'AGOSTINO, R; FRACASSI, F; PACIFICO, C; CAPEZZUTO, P
Univ. Barim, cent. studio chimica plasmi, dip. chimica, Bari 70126, Italy
Source

Journal of applied physics. 1992, Vol 71, Num 1, pp 462-471 ; ref : 21 ref

CODEN
JAPIAU
ISSN
0021-8979
Scientific domain
Crystallography; Electronics; Optics; Condensed state physics; Physics
Publisher
American Institute of Physics, Woodbury, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Appareillage Chimie Composition chimique Couche mince Etude expérimentale Gravure plasma Pression Spectrométrie photoélectron Surface Température Titane Traitement surface Microbalance quartz Métal transition
Keyword (en)
Instrumentation Chemistry Chemical composition Thin film Experimental study Plasma etching Pressure Photoelectron spectrometry Surface Temperature Titanium Surface treatment Transition metal
Keyword (es)
Instrumentación Química Composición química Capa fina Estudio experimental Grabado plasma Presión Espectrometría fotoelectrón Superficie Temperatura Titanio Tratamiento superficie Metal transición
Keyword (de)
Chemie Chemische Zusammensetzung Duennschicht Experimentelle Untersuchung Druck ESCA Spektrometrie Oberflaeche Temperatur Titan Oberflaechenbehandlung Uebergangsmetalle
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35B Surface structure and topography

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy

Discipline
Metals. Metallurgy Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
5463110

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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