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High-power 630-640 nm GaInP/GaAlInP laser diodes

Author
OU, S. S1 ; YANG, J. J; FU, R. J; HWANG, C. J
[1] Space & Technology Group, TRW res. cent., Redondo Beach CA 90278, United States
Source

Applied physics letters. 1992, Vol 61, Num 8, pp 892-894 ; ref : 12 ref

CODEN
APPLAB
ISSN
0003-6951
Scientific domain
Crystallography; Electronics; Optics; Condensed state physics
Publisher
American Institute of Physics, Melville, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Aluminium Gallium Indium Phosphure Mixte Gallium Indium Phosphure Mixte Grande puissance Laser injection Laser semiconducteur Rayonnement visible
Keyword (en)
Aluminium Gallium Indium Phosphides Mixed Gallium Indium Phosphides Mixed High power Injection laser Semiconductor laser Visible radiation
Keyword (es)
Aluminio Galio Indio Fosfuro Mixto Galio Indio Fosfuro Mixto Gran potencia Laser inyección Laser semiconductor Radiacion invisible
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B55 Lasers / 001B40B55P Semiconductor lasers; laser diodes

Discipline
Physics : optics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
5480573

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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