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Effect of cathode spacer layer on the current-voltage characteristics of resonant tunneling diodes

Author
MOUNAIX, P; VANBESIEN, O; LIPPENS, D
CNRS Univ. sci. techn. Lille flandres artoris, cent. hyperfréquences semiconducteurs, Villeneuve Ascq 59655, France
Source

Applied physics letters. 1990, Vol 57, Num 15, pp 1517-1519 ; ref : 10 ref

CODEN
APPLAB
ISSN
0003-6951
Scientific domain
Crystallography; Electronics; Optics; Condensed state physics
Publisher
American Institute of Physics, Melville, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Aluminium Gallium Arséniure Mixte Bande conduction Caractéristique courant tension Diode tunnel Etude expérimentale Gallium Arséniure Hétérojonction double Modélisation
Keyword (en)
Aluminium Gallium Arsenides Mixed Conduction band Voltage current curve Tunnel diode Experimental study Gallium Arsenides Double heterojunction Modeling
Keyword (es)
Aluminio Galio Arseniuro Mixto Banda conducción Característica corriente tensión Diodo túnel Estudio experimental Galio Arseniuro Heterounión doble Modelización
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
5520101

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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