Optical design for soft X-ray projection lithography
- Author
- WATANABE, Y; SUZUKI, M; MICHIZUKI, N; NIIBE, M; FUKUDA, Y
Canon res. cent., Atsugi Kanagawa 243-01, Japan - Source
Japanese journal of applied physics. 1991, Vol 30, Num 11B, pp 3053-3057 ; 1 ; ref : 6 ref
- CODEN
- JJAPA5
- ISSN
- 0021-4922
- Scientific domain
- Crystallography; Optics; Condensed state physics; Physics; Plasma physics
- Publisher
- Japanese journal of applied physics, Tokyo
- Publication country
- Japan
- Document type
- Article
- Language
- English
- Keyword (fr)
- Etude expérimentale Fréquence Lithographie Miroir Rayon X mou
- Keyword (en)
- Experimental study Frequency Lithography Mirror Soft X ray
- Keyword (es)
- Estudio experimental Frecuencia Litografía Espejo Rayo X blando
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03D Electronic equipment and fabrication. Passive components, printed wiring boards, connectics
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 5558102
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1143/JJAP.30.3053 
https://dx.doi.org/10.1143/JJAP.30.3053
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