Photolacke für die Deep-UV-Lithographie
- Other title
- Photoresist for deep-UV lithography (en)
- Author
- FUNHOFF, D; SCHWALM, R
- Source
Farbe + Lack. 1992, Vol 98, Num 3, pp 171-175 ; ref : 16 ref
- ISSN
- 0014-7699
- Scientific domain
- Polymers, paint and wood industries
- Publisher
- Vincentz, Hannover
- Publication country
- Germany
- Document type
- Article
- Language
- German
- Keyword (fr)
- Lithographie Photorésist Rayonnement UV Resist positif
- Keyword (en)
- Lithography Photoresist Ultraviolet radiation Positive resist
- Keyword (es)
- Litografía Fotorresistente Radiación ultravioleta Resistencia positiva
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers / 001D09D Organic polymers / 001D09D04 Properties and characterization / 001D09D04D Electrical, magnetic and optical properties
- Discipline
- Physical chemistry of polymers
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 5580317
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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