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Photolacke für die Deep-UV-Lithographie

Other title
Photoresist for deep-UV lithography (en)
Author
FUNHOFF, D; SCHWALM, R
Source

Farbe + Lack. 1992, Vol 98, Num 3, pp 171-175 ; ref : 16 ref

ISSN
0014-7699
Scientific domain
Polymers, paint and wood industries
Publisher
Vincentz, Hannover
Publication country
Germany
Document type
Article
Language
German
Keyword (fr)
Lithographie Photorésist Rayonnement UV Resist positif
Keyword (en)
Lithography Photoresist Ultraviolet radiation Positive resist
Keyword (es)
Litografía Fotorresistente Radiación ultravioleta Resistencia positiva
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers / 001D09D Organic polymers / 001D09D04 Properties and characterization / 001D09D04D Electrical, magnetic and optical properties

Discipline
Physical chemistry of polymers
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
5580317

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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