Electric properties of Ti―Si―N thin cermet films deposited in a triode sputtering system with a hot cathode
- Author
- POSADOWSKI, W1
[1] Tech. univ. Wrocław, inst. electron technology, Wrocław 50-372, Poland - Source
Thin solid films. 1988, Vol 162, pp 111-117 ; ref : 9 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Keyword (fr)
- Composition chimique Composé minéral Conductivité électrique Couche mince Céramique Etude expérimentale Métal transition Composé Préparation Silicium Titane Nitrure Mixte Température
- Keyword (en)
- Chemical composition Inorganic compound Electrical conductivity Thin film Ceramic materials Experimental study Transition metal Compounds Preparation Silicon Titanium Nitrides Mixed Temperature
- Keyword (es)
- Composición química Compuesto inorgánico Conductividad eléctrica Capa fina Cerámica Estudio experimental Metal transición Preparación Silicio Temperatura
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70C Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures / 001B70C50 Electronic transport phenomena in thin films and low-dimensional structures
- Discipline
- Physics of condensed state : electronic structure, electrical, magnetic and optical properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 6813835
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0040-6090(88)90199-X 
https://dx.doi.org/10.1016/0040-6090(88)90199-X
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