Influence of the polarization direction on two-beam coupling in photorefractive Bi12SiO20: diffusion regime
- Author
- MALLICK, S1 ; ROUEDE, D
[1] Univ. Pierre Marie Curie, lab. optique, Paris 75252, France - Source
Applied physics. B, Photophysics and laser chemistry. 1987, Vol 43, Num 4, pp 239-245 ; ref : 13 ref
- CODEN
- APPCDL
- ISSN
- 0721-7269
- Scientific domain
- General chemistry, physical chemistry; Optics
- Publisher
- Springer, Berlin
- Publication country
- Germany
- Document type
- Article
- Language
- English
- Keyword (fr)
- Bismuth Silicium Oxyde Mixte Couplage Effet photoréfractif Faisceau optique Optique non linéaire Polarisation optique
- Keyword (en)
- Bismuth Silicon Oxides Mixed Coupling Photorefractive effect Optical beam Non linear optics Optical polarization
- Keyword (es)
- Bismuto Acoplamiento Efecto fotorefractivo Haz óptico Optica no lineal Polarización óptica
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B65 Nonlinear optics
- Discipline
- Physics : optics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 7588904
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1007/BF00692494 
https://dx.doi.org/10.1007/BF00692494
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