Photo- and radiation-sensitive materials in microlithography
- Author
- TSUDA, M
Chiba univ., fac. pharmaceutical sci., lab. biophysical chemistry, Chiba 260, Japan - Source
Materials science reports. 1987, Vol 2, Num 5-6, pp 185-314 ; ref : 163 ref
- CODEN
- MSREEL
- ISSN
- 0920-2307
- Scientific domain
- Crystallography; Mechanics acoustics; Metallurgy, welding; Condensed state physics
- Publisher
- North-Holland, Amsterdam
- Publication country
- Netherlands
- Document type
- Serial Issue
- Language
- English
- Keyword (fr)
- Article synthèse Fabrication microélectronique Lithographie Resist
- Keyword (en)
- Review Microelectronic fabrication Lithography Resist
- Keyword (es)
- Artículo síntesis Fabricación microeléctrica Litografía Resistencia
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 7669423
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0920-2307(87)80005-1 
https://dx.doi.org/10.1016/S0920-2307(87)80005-1
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