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Discharge pumped CIF laser at 285 nm

Author
DIEGELMANN, M1 ; PROCH, D; ZHAO ZHENSHENG
[1] Dornier System GmbH, Friedrichshafen 7990, Germany
Source

Applied physics. B, Photophysics and laser chemistry. 1986, Vol 40, Num 2, pp 49-58 ; ref : 22 ref

CODEN
APPCDL
ISSN
0721-7269
Scientific domain
General chemistry, physical chemistry; Optics
Publisher
Springer, Berlin
Publication country
Germany
Document type
Article
Language
English
Keyword (fr)
Chlore Fluorure Décharge électrique Laser TEA Laser UV Laser gaz Rayonnement UV
Keyword (en)
Chlorine Fluorides Electric discharge TEA laser Ultraviolet laser Gas laser Ultraviolet radiation
Keyword (es)
Cloro Descarga electrica Láser TEA Láser UV Gas laser Rayos ultravioleta
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B55 Lasers / 001B40B55L Gas lasers including excimer and metal-vapor lasers

Discipline
Physics : optics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
8083019

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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