Discharge pumped CIF laser at 285 nm
- Author
- DIEGELMANN, M1 ; PROCH, D; ZHAO ZHENSHENG
[1] Dornier System GmbH, Friedrichshafen 7990, Germany - Source
Applied physics. B, Photophysics and laser chemistry. 1986, Vol 40, Num 2, pp 49-58 ; ref : 22 ref
- CODEN
- APPCDL
- ISSN
- 0721-7269
- Scientific domain
- General chemistry, physical chemistry; Optics
- Publisher
- Springer, Berlin
- Publication country
- Germany
- Document type
- Article
- Language
- English
- Keyword (fr)
- Chlore Fluorure Décharge électrique Laser TEA Laser UV Laser gaz Rayonnement UV
- Keyword (en)
- Chlorine Fluorides Electric discharge TEA laser Ultraviolet laser Gas laser Ultraviolet radiation
- Keyword (es)
- Cloro Descarga electrica Láser TEA Láser UV Gas laser Rayos ultravioleta
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B55 Lasers / 001B40B55L Gas lasers including excimer and metal-vapor lasers
- Discipline
- Physics : optics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 8083019
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1007/BF00694776 
https://dx.doi.org/10.1007/BF00694776
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