Nouvelles applications des structures magnétron excitées par microndes
- Other title
- New applications of microwave excited magnetrons structures (en)
- Author
- ARNAL, Y1 ; LACOSTE, A1 ; PELLETIER, J1
[1] Laboratoire d'Electrostatique et de Matériaux Diélectriques, CNRS, Université Joseph Fourier 25 rue des Martyrs - BP 166, 38042 Grenoble, France - Conference title
- Nouvelles tendances en procédés magnétron et arc pour le dépôt de couches minces
- Conference name
- Nouvelles Tendances en Procédés Magnétron et Arc pour le Dépôt de Couches Minces. Colloque (Mons 2000-10-14)
- Author (monograph)
- TERRAT, J. P (Editor)1 ; HECQ, M (Editor)2
Société Française du Vide, France (Funder/Sponsor)
Belvac (Funder/Sponsor)
Université de Mons-Hainaut ; Laboratoire de Chimie Analytique et Inorganique, Mons, Belgium (Funder/Sponsor)
[1] HEF R&D, Andrézieux-Bouthéon, France
[2] Université de Mons-Hainaut, Mons, Belgium - Source
Le Vide (1995). 2000, Vol 55, Num 297, pp 258-266 ; ref : 16 ref
- ISSN
- 1266-0167
- Scientific domain
- Chemical engineering; Metallurgy, welding
- Publisher
- Société française du vide, Paris
- Publication country
- France
- Document type
- Conference Paper
- Language
- French
- Keyword (fr)
- Article synthèse Basse pression Génération plasma Hyperfréquence Implantation ion Magnétron Pulvérisation Résonance cyclotronique électronique
- Keyword (en)
- Reviews Low pressure Plasma generation Microwave radiation Ion implantation Magnetrons Sprays Electron cyclotron-resonance
- Keyword (es)
- Generación plasma
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 814887
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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